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<emphasis role="bold">Overview</emphasis> One of the unique properties of semiconductor materials is that their conductivity and the type of conductivity (N or P) can be created and controlled. In this chapter, the formation of specific “pockets” of conductive regions and N-P in and on the wafer surface is described. The principles and practice of the two doping techniques, diffusion and ion-implantation, are explained.
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Peter Van Zant: Microchip Fabrication: A Practical Guide to Semiconductor Processing, Fifth Edition. Doping, Chapter (McGraw-Hill Professional, 2004 2000 1997 1984), AccessEngineering Export